IJSRP, Volume 5, Issue 3, March 2015 Edition [ISSN 2250-3153]
M. K. Basher, K. M. Shorowordi
This paper gives an overview of the materials and methods used for fabricating a monocrystalline silicon solar cell. The aim of this research is to study the solar cell fabrication technology and fabrication of monocrystalline silicon solar using phosphorous diffusion technique locally. For solar cell fabrication we have used several number of processing steps to get the final solar cell output. At first we took a p-type monocrystalline silicon wafer with square shape 150×150 mm2 in size, 200µm in thickness and which is a (100) oriented Czochralski Si wafer. Then Cleaning and texturing of the wafer was done using different chemical solutions and edge isolation of wafer was done using edge isolation paste. Phosphorous diffusion was done by diffusion furnace to form p-n junction using liquid Phosphorus Oxychloride (POCl3). Front and back side metallization was done by screen printers using silver paste and aluminum paste respectively. Then Rapid Thermal Annealing of the wafer was done at high zone temperature for curing the contact. Finally, fabricated solar cell was characterized by LIV tester.